METHOD OF WATER REPELLENT TREATMENT FOR PATTERN SURFACE

摘要

Provided is a method of water repellent treatment for a pattern surface, the method including the steps of agitatingly mixing a perfluoropolyether-group-containing silane water repellent, an organic acid, a fluorine-containing solvent capable of dissolving the perfluoropolyether-group-containing silane water repellent and the organic acid, and water to hydrolyze the perfluoropolyether-group-containing silane water repellent, thereby obtaining a partial hydrolysate solution; forming a photosensitive resin layer on a substrate; applying the partial hydrolysate solution onto the photosensitive resin layer to form a water-repellent film; performing patterning exposure to the photosensitive resin layer and the water-repellent film; performing heat treatment to collectively cure an exposed portion of the photosensitive resin layer and the water-repellent film; and removing a non-exposed portion of the photosensitive resin layer and the water-repellent film by development treatment to form a pattern.

主权项

1. A method of water repellent treatment for a pattern surface, the method comprising the steps of:
a) agitatingly mixing a perfluoropolyether-group-containing silane water repellent, an organic acid, a fluorine-containing solvent capable of dissolving the perfluoropolyether-group-containing silane water repellent and the organic acid, and water to hydrolyze the perfluoropolyether-group-containing silane water repellent, thereby obtaining a partial hydrolysate solution; b) forming a photosensitive resin layer on a substrate; c) applying the partial hydrolysate solution onto the photosensitive resin layer to form a water-repellent film; d) performing patterning exposure to the photosensitive resin layer and the water-repellent film; e) performing heat treatment to collectively cure an exposed portion of the photosensitive resin layer and the water-repellent film; and f) removing a non-exposed portion of the photosensitive resin layer and the water-repellent film by development treatment to form a pattern.