| 摘要 |
The invention relates to a method for producing a micromechanical component and to a corresponding micromechanical component. The production method comprises the following steps: providing a substrate (1) with a monocrystalline starting layer (1c) which is exposed in structured regions (3a-3e), said structured regions (3a-3e) having an upper face (O) and lateral flanks (F), wherein a catalyst layer (2), which is suitable for promoting a silicon epitaxial growth of the exposed upper face (O) of the structured monocrystalline starting layer (1c), is provided on the upper face (O), and no catalyst layers (2) are provided on the flanks (F); and carrying out a selective epitaxial growth process on the upper face (O) of the monocrystalline starting layer (1c) using the catalyst layer (2) in a reactive gas atmosphere in order to form a micromechanical functional layer (3'). |
