发明名称 |
LITHOGRAPHIC APPARATUS COMPRISING SUBSTRATE TABLE |
摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus that enables accurate focus positioning of a substrate.SOLUTION: A lithographic apparatus includes: an illumination system configured to adjust a radiation beam; and a support medium constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes: a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system; and a position controller configured to control a position of the substrate table and arranged to drive the positioner and the substrate surface actuator. |
申请公布号 |
JP2014170957(A) |
申请公布日期 |
2014.09.18 |
申请号 |
JP20140093766 |
申请日期 |
2014.04.30 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
BUTLER HANS;JAN VAN EIJK;HOL SVEN ANTOINE JOHANN;JOHANNES PETRUS MARTINUS BERNARDUS;YAN-SHAN HUANG |
分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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