发明名称 CROSSLINKED RANDOM COPOLYMER FILMS FOR BLOCK COPOLYMER DOMAIN ORIENTATION
摘要 Surface-modifying layers, including neutral layers for vertical domain-forming block copolymers of styrene and methyl methacrylate are provided. Also provided are self-assembled block copolymer structures incorporating the surface modifying layers, methods of fabricating such structures and methods of using the structures in BCP lithography applications. The surface-modifying layers comprise a crosslinked copolymer film, wherein the crosslinked copolymers are random copolymers polymerized from styrene monomers and/or (meth)acrylate monomers and crosslinkable epoxy group-functionalized monomers. The crosslinked copolymer films are characterized by a high content of the crosslinkable epoxy group-functionalized monomer.
申请公布号 US2014263175(A1) 申请公布日期 2014.09.18
申请号 US201313828803 申请日期 2013.03.14
申请人 Wisconsin Alumni Research Foundation 发明人 Gopalan Padma;Han Eungnak;Kim Myungwoong
分类号 C08J7/04;C08J7/02 主分类号 C08J7/04
代理机构 代理人
主权项 1. A method of forming a self-assembled block copolymer film, the method comprising: forming a crosslinked copolymer film on a substrate surface, the crosslinked copolymer film comprising crosslinked random copolymer chains, wherein the random copolymer chains comprise styrene monomers copolymerized with crosslinkable epoxy group-functionalized monomers and, optionally, one or more additional monomers, wherein the epoxy group-functionalized monomers are acrylate monomers, methacrylate monomers or styrenic monomers and further wherein the epoxy groups are linked to the monomers by a non-cyclic linking group; the random copolymer chains comprising at least 5% of the epoxy group-functionalized monomers and no greater than 5% of the additional monomers; depositing a block copolymer over the crosslinked copolymer film, wherein the block copolymer comprises copolymerized styrene monomers and further wherein the crosslinked copolymer film provides a neutral layer for the self-assembly of the block copolymer into vertical domains; and subjecting the block copolymer to conditions that induce the block copolymer to self-assemble into vertical domains.
地址 Madison WI US