发明名称 |
CROSSLINKED RANDOM COPOLYMER FILMS FOR BLOCK COPOLYMER DOMAIN ORIENTATION |
摘要 |
Surface-modifying layers, including neutral layers for vertical domain-forming block copolymers of styrene and methyl methacrylate are provided. Also provided are self-assembled block copolymer structures incorporating the surface modifying layers, methods of fabricating such structures and methods of using the structures in BCP lithography applications. The surface-modifying layers comprise a crosslinked copolymer film, wherein the crosslinked copolymers are random copolymers polymerized from styrene monomers and/or (meth)acrylate monomers and crosslinkable epoxy group-functionalized monomers. The crosslinked copolymer films are characterized by a high content of the crosslinkable epoxy group-functionalized monomer. |
申请公布号 |
US2014263175(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201313828803 |
申请日期 |
2013.03.14 |
申请人 |
Wisconsin Alumni Research Foundation |
发明人 |
Gopalan Padma;Han Eungnak;Kim Myungwoong |
分类号 |
C08J7/04;C08J7/02 |
主分类号 |
C08J7/04 |
代理机构 |
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代理人 |
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主权项 |
1. A method of forming a self-assembled block copolymer film, the method comprising:
forming a crosslinked copolymer film on a substrate surface, the crosslinked copolymer film comprising crosslinked random copolymer chains, wherein the random copolymer chains comprise styrene monomers copolymerized with crosslinkable epoxy group-functionalized monomers and, optionally, one or more additional monomers, wherein the epoxy group-functionalized monomers are acrylate monomers, methacrylate monomers or styrenic monomers and further wherein the epoxy groups are linked to the monomers by a non-cyclic linking group; the random copolymer chains comprising at least 5% of the epoxy group-functionalized monomers and no greater than 5% of the additional monomers; depositing a block copolymer over the crosslinked copolymer film, wherein the block copolymer comprises copolymerized styrene monomers and further wherein the crosslinked copolymer film provides a neutral layer for the self-assembly of the block copolymer into vertical domains; and subjecting the block copolymer to conditions that induce the block copolymer to self-assemble into vertical domains. |
地址 |
Madison WI US |