发明名称 |
Cylindrical evaporation source |
摘要 |
The source (1) has an outer cylinder wall including target material to be evaporated and two magnetic field sources (401, 402), which form a part of a magnet system (400). The magnetic field sources are provided at a carrier system (500) such that shape and strength of the magnetic field is set in accordance with a predefinable scheme in a spatial region. The carrier system sets the shape and strength of the field such that one of the magnetic field sources is arranged at a carrier arm (501) and pivoted by a predefinable pivot angle (alpha 1) with respect to a pivot axis (5011). The magnetic field sources are selected from a group consisting of a permanent magnet, ferrite magnet and an electromagnet. The magnet system forms a balanced magnetron or unbalanced magnetron. |
申请公布号 |
EP2778253(A1) |
申请公布日期 |
2014.09.17 |
申请号 |
EP20130195135 |
申请日期 |
2013.11.29 |
申请人 |
SULZER METAPLAS GMBH |
发明人 |
VETTER, JÖRG DR.;ESSER, STEFAN DR.;MÜLLER, JÜRGEN DR.;ERKENS, GEORG DR. |
分类号 |
C23C14/24;C23C14/32;C23C14/34;C23C14/35;H01J37/34 |
主分类号 |
C23C14/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|