发明名称 Cylindrical evaporation source
摘要 The source (1) has an outer cylinder wall including target material to be evaporated and two magnetic field sources (401, 402), which form a part of a magnet system (400). The magnetic field sources are provided at a carrier system (500) such that shape and strength of the magnetic field is set in accordance with a predefinable scheme in a spatial region. The carrier system sets the shape and strength of the field such that one of the magnetic field sources is arranged at a carrier arm (501) and pivoted by a predefinable pivot angle (alpha 1) with respect to a pivot axis (5011). The magnetic field sources are selected from a group consisting of a permanent magnet, ferrite magnet and an electromagnet. The magnet system forms a balanced magnetron or unbalanced magnetron.
申请公布号 EP2778253(A1) 申请公布日期 2014.09.17
申请号 EP20130195135 申请日期 2013.11.29
申请人 SULZER METAPLAS GMBH 发明人 VETTER, JÖRG DR.;ESSER, STEFAN DR.;MÜLLER, JÜRGEN DR.;ERKENS, GEORG DR.
分类号 C23C14/24;C23C14/32;C23C14/34;C23C14/35;H01J37/34 主分类号 C23C14/24
代理机构 代理人
主权项
地址