发明名称 LIQUID SUPPLYING APPARATUS
摘要 <p>An objective of the present invention to prevent a liquid from falling down from a nozzle when discharging a processing solution of a liquid supply source from the nozzle stops in order to supply the processing solution to a processed object from the nozzle. A first liquid supply passage (3A) and a second liquid supply passage (3B) are connected perpendicular to each other between a liquid supply source (2) and the nozzle (24) in a liquid pressure adjustment chamber (8) provided therein with a liquid pressure adjustment valve (31B). The first liquid supply passage (3A) is disposed opposite to an upstream end of the second liquid supply passage (3B) based on a diaphragm of the liquid pressure adjustment valve (31B). Furthermore, after the discharge of the processing solution is terminated, liquid pressure in the liquid supply passage (3) is reduced once. Next, when the liquid pressure starts to be increased, a diaphragm (6) of a liquid pressure adjustment valve (31B) is retreated.</p>
申请公布号 KR20140109258(A) 申请公布日期 2014.09.15
申请号 KR20140017654 申请日期 2014.02.17
申请人 TOKYO ELECTRON LIMITED 发明人 OOKUBO TAKAHIRO;TOTSUKA SEIYA
分类号 H01L21/027 主分类号 H01L21/027
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