| 摘要 |
Disclosed is a plating rack apparatus used in plating substrates for manufacturing various circuit plates. The plating rack apparatus includes a main rack body having a supporter formed to correspond to a circumference of a substrate; a fixing unit having a first fixer and a second fixer spaced apart while in a state capable of holding an edge portion facing the circumference of the substrate at the main rack body side; an adjusting supporter formed to movably support the first fixer or the second fixer of the fixing unit while in a state capable of adjusting location at the main rack body side; and a rotation locking unit locked to and coming in contact with the adjusting supporter by rotation when the adjusting supporter is moved to fix the adjusting supporter in the state of adjusting location. |
