发明名称 METHOD FOR PRODUCING CONDUCTIVE DIRECT METAL BONDING
摘要 The invention comprises the steps of -a) Providing a first substrate (1) covered by a metal layer (2) and a second substrate (3) covered by a metal layer (4), -b) Bringing the metal layers (2, 4) into direct contact in such a way as to form a bonding interface (6) comprising metal material bridges (5) separated by cavities fluidly connected together, -d) Submerging the bonding interface (6) in an oxidising fluid (8) in such a way as to form a metal oxide at least partially filling the cavities and metal/metal oxide/metal contact areas (9). The invention also concerns a structure (100) comprising a first substrate (1), a first metal layer (2), a second metal layer (4) forming a bonding interface (6) with the first metal layer (2), and a second substrate (3), the bonding interface (6) comprising metal material bridges (5) separated by cavities, a metal oxide at least partially filling the cavities and metal/metal oxide/metal contact areas (9).
申请公布号 WO2014135802(A1) 申请公布日期 2014.09.12
申请号 WO2014FR50504 申请日期 2014.03.05
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 GONDCHARTON, PAUL;BENAISSA, LAMINE;IMBERT, BRUNO
分类号 H01L21/18;H01L25/065 主分类号 H01L21/18
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