发明名称 |
INSPECTION APPARATUS AND INSPECTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a technique for facilitating a device configuration for scanning an inspection object with pulse light.SOLUTION: An inspection apparatus 100 inspects an inspection object 9 which is a semiconductor device or a photo device. The inspection apparatus 100 includes: a stage 11 for holding the inspection object 9; a femtosecond laser 121 for emitting pulse light LP11; a galvanomirror 125 for irradiating the inspection object 9 with the pulse light LP11 obliquely, and scanning the inspection object 9 with the pulse light by changing an optical path of the pulse light LP11; and a detection unit 13 for detecting an electromagnetic wave LT1 emitted according to irradiation of the pulse light LP11 from the inspection object 9 in a non-coaxial manner with the pulse light LP11. |
申请公布号 |
JP2014167443(A) |
申请公布日期 |
2014.09.11 |
申请号 |
JP20130039702 |
申请日期 |
2013.02.28 |
申请人 |
DAINIPPON SCREEN MFG CO LTD;OSAKA UNIV |
发明人 |
ITO AKIRA;NAKANISHI HIDETOSHI;TOUCHI MASAKICHI;KAWAYAMA IWAO |
分类号 |
G01N21/956;G01M11/00;G01N21/3581;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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