发明名称 INSPECTION APPARATUS AND INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a technique for facilitating a device configuration for scanning an inspection object with pulse light.SOLUTION: An inspection apparatus 100 inspects an inspection object 9 which is a semiconductor device or a photo device. The inspection apparatus 100 includes: a stage 11 for holding the inspection object 9; a femtosecond laser 121 for emitting pulse light LP11; a galvanomirror 125 for irradiating the inspection object 9 with the pulse light LP11 obliquely, and scanning the inspection object 9 with the pulse light by changing an optical path of the pulse light LP11; and a detection unit 13 for detecting an electromagnetic wave LT1 emitted according to irradiation of the pulse light LP11 from the inspection object 9 in a non-coaxial manner with the pulse light LP11.
申请公布号 JP2014167443(A) 申请公布日期 2014.09.11
申请号 JP20130039702 申请日期 2013.02.28
申请人 DAINIPPON SCREEN MFG CO LTD;OSAKA UNIV 发明人 ITO AKIRA;NAKANISHI HIDETOSHI;TOUCHI MASAKICHI;KAWAYAMA IWAO
分类号 G01N21/956;G01M11/00;G01N21/3581;H01L21/66 主分类号 G01N21/956
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