发明名称 DEVICE AND METHOD FOR FORMING PATTERN, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DISPLAY PANEL
摘要 PROBLEM TO BE SOLVED: To carry out drawing coordinate position correction perpendicular to a scanning direction in high definition by adding a small-scale circuit structure without increasing a load for a drawing process, and to perform a high quality pattern formation at a high throughput.SOLUTION: An irradiation device irradiates a light beam while moving an entire DMD in a scanning direction by inclining it with respect to a direction vertical to the scanning direction so that a mirror at a first row and a first column among m rows and n columns, which is actually used for drawing in a mirror group, shifts in the scanning direction by p (1-1/n) pieces (p is an integer) in terms of a mirror group center coordinate interval with respect to a mirror at the m-th row and the first column. The irradiation device divides drawing data allocated to the mirror group into data corresponding to q pieces of layer numbers with a section obtained by dividing the center coordinate interval by an integer q used as a unit, stores them in a drawing data memory by rearranging them for every layer number, outputs drawing data corresponding to the layer numbers to the DMD, and also shifts an address to a layer data memory memorizing correspondence between the mirror group and the drawing data.
申请公布号 JP2014168040(A) 申请公布日期 2014.09.11
申请号 JP20130225909 申请日期 2013.10.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MOCHIZUKI MASAAKI;HONDA HIDEYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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