发明名称 SLICE AND VIEW WITH DECORATION
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and device for observing defects using a charged particle beam system.SOLUTION: Buried defects on a substrate 122 are observed using charged particle beams. The defects found are imaged by milling a series of slices and performing a light, preferential etch to provide a topographical interface between materials having similar secondary electron emission characteristics. The slices are sufficiently small to capture small defects, but are sufficiently large to overcome problems with redeposition.</p>
申请公布号 JP2014167474(A) 申请公布日期 2014.09.11
申请号 JP20140062055 申请日期 2014.03.25
申请人 FEI CO 发明人 BRAY MATTHEW;CASTAGNA MARC
分类号 G01N1/28;G01N1/32;H01J37/317 主分类号 G01N1/28
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