CONTAMINATION PREVENTION FOR PHOTOMASK IN EXTREME ULTRAVIOLET LITHOGRAPHY APPLICATION

摘要

Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. In one embodiment, an apparatus for removing debris particles from a beam of radiation includes a mask station comprising a chamber body, a mask stage disposed in the mask station, and a conductive plate having an opening formed therein, wherein the conductive plate is disposed in a spaced apart relationship to the mask stage in the mask station, defining an interior volume between the mask stage and the conductive plate.

主权项

1. A method for removing debris particles in a beam of radiation, comprising:
providing a photomask disposed on a mask stage in a mask station; providing a beam of radiation passing through a conductive plate disposed in the mask station toward the photomask; applying a power to the conductive plate to create an electrical potential between the photomask and the conductive plate; and removing debris particles from the beam of radiation by repelling debris particles away from the photomask using electrostatic force outward from the mask station.