| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition from which a resist pattern having excellent line edge roughness (LER) can be produced, and to provide an acid generator comprising the salt, and a resist composition or the like containing the acid generator.SOLUTION: The salt is expressed by formula (I). In formula (I), Rrepresents -(X-O)-R, where Rrepresents a monovalent hydrocarbon group having 1 to 12 carbon atoms, Xrepresents a divalent hydrocarbon group having 2 to 12 carbon atoms, and n represents an integer of 0 to 6; and Arepresents an organic anion.] |
