发明名称 Ball Amount Process in the Manufacturing of Integrated Circuit
摘要 An integrated circuit structure includes a semiconductor substrate, a metal pad over the semiconductor substrate, a passivation layer including a portion over the metal pad, a polymer layer over the passivation layer, and a Post-Passivation Interconnect (PPI) over the polymer layer. The PPI is electrically connected to the metal pad. The PPI includes a PPI line have a first width, and a PPI pad having a second width greater than the first width. The PPI pad is connected to the PPI line. The PPI pad includes an inner portion having a first thickness, and an edge portion having a second thickness smaller than the first thickness.
申请公布号 US2014252611(A1) 申请公布日期 2014.09.11
申请号 US201414189434 申请日期 2014.02.25
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chen Hsien-Wei;Yu Tsung-Yuan;Lu Wen-Hsiung;Cheng Ming-Da
分类号 H01L23/498;H01L21/768;H01L23/522 主分类号 H01L23/498
代理机构 代理人
主权项 1. An integrated circuit structure comprising: a semiconductor substrate; a metal pad over the semiconductor substrate; a passivation layer comprising a portion over the metal pad; a polymer layer over the passivation layer; and a Post-Passivation Interconnect (PPI) over the polymer layer, wherein the PPI is electrically connected to the metal pad, wherein the PPI comprises: a PPI line have a first width; anda PPI pad having a second width greater than the first width, wherein the PPI pad is connected to the PPI line, and wherein the PPI pad comprises an inner portion having a first thickness, and an edge portion having a second thickness smaller than the first thickness.
地址 Hsin-Chu TW