发明名称 |
Ball Amount Process in the Manufacturing of Integrated Circuit |
摘要 |
An integrated circuit structure includes a semiconductor substrate, a metal pad over the semiconductor substrate, a passivation layer including a portion over the metal pad, a polymer layer over the passivation layer, and a Post-Passivation Interconnect (PPI) over the polymer layer. The PPI is electrically connected to the metal pad. The PPI includes a PPI line have a first width, and a PPI pad having a second width greater than the first width. The PPI pad is connected to the PPI line. The PPI pad includes an inner portion having a first thickness, and an edge portion having a second thickness smaller than the first thickness. |
申请公布号 |
US2014252611(A1) |
申请公布日期 |
2014.09.11 |
申请号 |
US201414189434 |
申请日期 |
2014.02.25 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chen Hsien-Wei;Yu Tsung-Yuan;Lu Wen-Hsiung;Cheng Ming-Da |
分类号 |
H01L23/498;H01L21/768;H01L23/522 |
主分类号 |
H01L23/498 |
代理机构 |
|
代理人 |
|
主权项 |
1. An integrated circuit structure comprising:
a semiconductor substrate; a metal pad over the semiconductor substrate; a passivation layer comprising a portion over the metal pad; a polymer layer over the passivation layer; and a Post-Passivation Interconnect (PPI) over the polymer layer, wherein the PPI is electrically connected to the metal pad, wherein the PPI comprises:
a PPI line have a first width; anda PPI pad having a second width greater than the first width, wherein the PPI pad is connected to the PPI line, and wherein the PPI pad comprises an inner portion having a first thickness, and an edge portion having a second thickness smaller than the first thickness. |
地址 |
Hsin-Chu TW |