发明名称 |
REMOTE PLASMA CLEANING METHOD AND APPARATUS FOR APPLYING SAID METHOD |
摘要 |
<p>A vacuum processing system with a vacuum chamber has an inlet, at least first and second outlets, exhaust means at a first of said outlets and a remote plasma source RPS, wherein the RPS is attached to a connecting point to the second of said outlets. In a method for remote plasma cleaning of a vacuum processing system with such an arrangement a flow of radicals is generated by said remote plasma source and directed to the first of said outlets whilst operating exhaust means via the second of said outlets.</p> |
申请公布号 |
EP2311065(B1) |
申请公布日期 |
2014.09.10 |
申请号 |
EP20090775738 |
申请日期 |
2009.07.07 |
申请人 |
TEL SOLAR AG |
发明人 |
LEU, FELIX-GEORGE;ELLERT, CHRISTOPH;BÜCHEL, GEROLD;MARTIN, JAVIER |
分类号 |
H01J37/32;C23C16/44 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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