发明名称 Method and apparatus for monitoring electron beam condition of scanning electron microscope
摘要 A method and an apparatus for monitoring an electron beam condition of an SEM are provided. The SEM includes an electron gun and an electromagnetic lens system. The method includes acquiring quality parameters of an input electron beam, wherein the input electron beam is provided by the electron gun to the electromagnetic lens system, acquiring a current set of operation parameters of the electromagnetic lens system, calculating quality parameters of an output electron beam of the electromagnetic lens system, based on the quality parameters of the input electron beam and one or more operation parameters of the current set of operation parameters, and determining, based on the quality parameters of the output electron beam, whether calibration of the SEM is required.
申请公布号 US8829424(B2) 申请公布日期 2014.09.09
申请号 US201313756148 申请日期 2013.01.31
申请人 Semiconductor Manufacturing International (Shanghai) Corporation;Semiconductor Manufacturing International (Beijing) Corporation 发明人 Cai BoXiu;Huang Yi
分类号 G01D18/00;H01J37/26 主分类号 G01D18/00
代理机构 Innovation Counsel LLP 代理人 Innovation Counsel LLP
主权项 1. A method for monitoring an electron beam condition of a scanning electron microscope (SEM), the SEM comprising an electron gun and an electromagnetic lens system, the method comprising: acquiring quality parameters of an input electron beam, wherein the input electron beam is provided by the electron gun to the electromagnetic lens system; acquiring a current set of operation parameters of the electromagnetic lens system; calculating quality parameters of an output electron beam of the electromagnetic lens system, based on the quality parameters of the input electron beam and one or more operation parameters of the current set of operation parameters; and determining, based on the quality parameters of the output electron beam, whether calibration of the SEM is required.
地址 CN