发明名称 |
Ditches near semiconductor fins and methods for forming the same |
摘要 |
A device includes a semiconductor substrate, and isolation regions extending into the semiconductor substrate. A semiconductor strip is between and contacting the isolation regions. A semiconductor fin overlaps, and is joined to, the semiconductor strip. A ditch extends from a top surface of the isolation regions into the isolation regions, wherein the ditch adjoins the semiconductor fin. |
申请公布号 |
US8829606(B1) |
申请公布日期 |
2014.09.09 |
申请号 |
US201313838407 |
申请日期 |
2013.03.15 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
van Dal Mark |
分类号 |
H01L29/66;H01L21/8238;H01L29/78 |
主分类号 |
H01L29/66 |
代理机构 |
Slater and Matsil, L.L.P. |
代理人 |
Slater and Matsil, L.L.P. |
主权项 |
1. A device comprising:
a semiconductor substrate; isolation regions extending into the semiconductor substrate; a semiconductor strip between and contacting the isolation regions; and a semiconductor fin overlapping and joined to the semiconductor strip, wherein a ditch extends from a top surface of the isolation regions into the isolation regions, and wherein the ditch adjoins the semiconductor fin. |
地址 |
Hsin-Chu TW |