发明名称 Ditches near semiconductor fins and methods for forming the same
摘要 A device includes a semiconductor substrate, and isolation regions extending into the semiconductor substrate. A semiconductor strip is between and contacting the isolation regions. A semiconductor fin overlaps, and is joined to, the semiconductor strip. A ditch extends from a top surface of the isolation regions into the isolation regions, wherein the ditch adjoins the semiconductor fin.
申请公布号 US8829606(B1) 申请公布日期 2014.09.09
申请号 US201313838407 申请日期 2013.03.15
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 van Dal Mark
分类号 H01L29/66;H01L21/8238;H01L29/78 主分类号 H01L29/66
代理机构 Slater and Matsil, L.L.P. 代理人 Slater and Matsil, L.L.P.
主权项 1. A device comprising: a semiconductor substrate; isolation regions extending into the semiconductor substrate; a semiconductor strip between and contacting the isolation regions; and a semiconductor fin overlapping and joined to the semiconductor strip, wherein a ditch extends from a top surface of the isolation regions into the isolation regions, and wherein the ditch adjoins the semiconductor fin.
地址 Hsin-Chu TW
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