发明名称 SUPPORTING DEVICE AND SUPPORTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a supporting device capable of maintaining stability of location means.SOLUTION: A supporting device 5 comprises: a base 50; location means 55 having a location face 56 for locating a supported material WF; and elevation means 6 provided between the base 50 and the location means 55 and elevating the location means 55 relative to the base 50. The elevation means 6 has center elevation means 60 positioned at a center of the location means 55, and outer edge elevation means 70 positioned at an outer edge of the location means 55. The center elevation means 60 and the outer edge elevation means 70 has: first members 61, 71 having first and third inclined faces 62, 72 inclined relative to the location face 56 provided to the location means 55; and second members 64, 74 moving along the first and third inclined faces 62, 72 provided on the base 50. The first members 61, 71 and the second members 64, 74 relatively move along the first and third inclined faces 62, 72, so as to elevate/lower the location means 55.
申请公布号 JP2014165195(A) 申请公布日期 2014.09.08
申请号 JP20130032177 申请日期 2013.02.21
申请人 LINTEC CORP 发明人 TAKANO TAKESHI
分类号 H01L21/683 主分类号 H01L21/683
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