CARBON FILM FORMATION METHOD, AND CARBON FILM

摘要

A carbon film formation method according to one embodiment comprises: supplying an aromatic hydrocarbon gas having a methyl group into a treatment chamber in which a material to be treated is placed; generating plasma of a noble gas in a plasma generation chamber which is isolated from the treatment chamber by a blocking section; supplying particles in the plasma into the treatment chamber through an opening in the blocking section; and irradiating the particles with the aromatic hydrocarbon gas. In this manner, a carbon film having a &pgr;-conjugated cyclic structure or a &pgr;-conjugated chain-like structure is formed on the material.