Mask Assignment Optimization

摘要

A method for optimizing mask assignment for multiple pattern processes includes, through a computing system, defining which of a number of vias to be formed between two metal layers are critical based on metal lines interacting with the vias, determining overlay control errors for an alignment tree that defines mask alignment for formation of the two metal layers and the vias, and setting both the alignment tree and mask assignment for the vias so as to maximize the placement of critical vias on masks that have less overlay control error to the masks forming the relevant metal lines.

主权项

1. A method for optimizing mask assignment for multiple pattern processes, the method comprising:
through a computing system, defining which of a number of vias to be formed between two metal layers are critical based on metal lines interacting with the vias; through the computing system, determining overlay control errors for an alignment tree that defines mask alignment for formation of the two metal layers and the vias; and through the computing system, setting both the alignment tree and mask assignment for the vias so as to maximize the placement of critical vias on masks that have less overlay control error to the masks forming the relevant metal lines.