发明名称 EXPOSURE DEVICE AND IMAGE FORMATION DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress excessive deflection of an exposure part on which a plurality of light-emitting bodies is arranged in a direction crossing an optical axis of the light-emitting bodies and an arrangement direction of the light-emitting bodies.SOLUTION: An exposure device of the present invention includes: an LPH 14 having a plurality of light-emitting chips arranged in a direction along a rotary shaft of a photoreceptor drum to expose the photoreceptor drum; a support housing for supporting the LPH 14; and a regulation part 65 for supporting the LPH 14 to regulate deflection of the LPH 14 when the LPH 14 supported by the support housing receives force in a direction crossing an optical axis direction of the light-emitting chips and an arrangement direction of the light-emitting chips to be deflected.
申请公布号 JP2014159087(A) 申请公布日期 2014.09.04
申请号 JP20130029673 申请日期 2013.02.19
申请人 FUJI XEROX CO LTD 发明人 SAKAMOTO TETSUYA
分类号 B41J2/44;B41J2/45;B41J2/455;G03G21/16 主分类号 B41J2/44
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