| 发明名称 |
Electromagnetic field application system |
| 摘要 |
<p>The present invention is based on the property that the electric and magnetic fields are independent of each other and normal to each other and the property that the deflection of a charged particle beam by the electromagnetic field follows the rule of linear combination. The present invention employs a system that creates a region in which there exist both electromagnetic field and controls the deflection of a charged particle beam in each of the electric and magnetic fields.
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| 申请公布号 |
EP2315231(A3) |
申请公布日期 |
2014.09.03 |
| 申请号 |
EP20100008099 |
申请日期 |
2010.08.03 |
| 申请人 |
HITACHI LTD. |
发明人 |
HARADA, KEN;SUGAWARA, AKIRA;MORIYA, NOBORU |
| 分类号 |
H01J37/20;H01J37/09;H01J37/26 |
主分类号 |
H01J37/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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