| 摘要 |
A film thickness measuring device according to the present invention includes a spectroscopic sensor (113) and a data processor (120), wherein the spectroscopic sensor measures spectroscopic data of a film coated on a substrate and the data processor obtains measured color characteristic variables from the measured spectroscopic data, compares the measured color characteristic variables with plural sets of theoretical color characteristic variables obtained for plural sets of values of thickness and index of refraction of the film, determines index of refraction of the film using set of the values corresponding to the set of theoretical color characteristic variables which minimizes a difference between the set of theoretical color characteristic variables and the measured color characteristic variables, and determines thickness of the film using the index of refraction of the film. |
