发明名称 SAPPHIRE PROPERTY MODIFICATION THROUGH ION IMPLANTATION
摘要 Systems and methods for strengthening a sapphire part (100) are described herein. One method may take the form of orienting a first surface (101) of a sapphire member (100) relative to an ion implantation device, selecting an ion implantation concentration and directing ions (131) at the first surface (101) of the sapphire member (100). The ions (131) are embedded under the first surface (101) to create compressive stress in the sapphire surface (100).
申请公布号 EP2772565(A2) 申请公布日期 2014.09.03
申请号 EP20140155530 申请日期 2014.02.18
申请人 APPLE INC. 发明人 MEMERING, DALE N.;PREST, CHRISTOPHER D.;WEBER, DOUGLAS J.
分类号 C23C14/48;C23C14/00;C23C14/04;C30B29/20;C30B31/00;C30B31/14;C30B31/22;H01J37/317;H01J37/32 主分类号 C23C14/48
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