发明名称 Photosensitive resin composition for color filter and color filter including the same
摘要 Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.;
申请公布号 US8822110(B2) 申请公布日期 2014.09.02
申请号 US201213589529 申请日期 2012.08.20
申请人 Cheil Industries Inc. 发明人 Lee Chang-Min;Kim Kwang-Seop;Choi Hyun-Moo;Paek Ho-Jeong;Cheon Hwan-Sung
分类号 G03F1/00;G03C1/00 主分类号 G03F1/00
代理机构 Additon, Higgins & Pendleton, P.A. 代理人 Additon, Higgins & Pendleton, P.A.
主权项 1. A photosensitive resin composition for a color filter, comprising: (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent: wherein, in Chemical Formula 1, R1 and R2 are the same or different and are each independently hydrogen or substituted or unsubstituted C1 to C30 alkyl, and Q is represented by the following Chemical Formula 2, wherein, in Chemical Formula 2, R3 is hydrogen or substituted or unsubstituted C1 to C30 alkyl, Y1 is C1 to C30 alkylene, X1 and X2 are the same or different and are each independently —O—, —N(H)—, or —S—.
地址 Gumi-si KR