| 发明名称 | Siloxane-based compound, photosensitive composition comprising the same and photosensitive material | ||
| 摘要 | The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material. | ||
| 申请公布号 | US8822112(B2) | 申请公布日期 | 2014.09.02 |
| 申请号 | US201314005151 | 申请日期 | 2013.01.25 |
| 申请人 | LG Chem, Ltd. | 发明人 | Lee Keon Woo;Kwak Sang Kyu;Lee Changsoon;Kim Hyehyeon;Kim Saehee |
| 分类号 | G03F7/004;C07F7/10 | 主分类号 | G03F7/004 |
| 代理机构 | Rothwell, Figg, Ernst & Manbeck, P.C. | 代理人 | Rothwell, Figg, Ernst & Manbeck, P.C. |
| 主权项 | 1. A compound represented by the following Formula 1: in Formula 1, R1, R1′, R1″, R2, R2′, and R2″ are the same as or different from each other, and each independently an alkoxy group having 1 to 6 carbon atoms, R3 and R4 are the same as or different from each other, and each independently an alkyl group having 1 to 6 carbon atoms, R5, R6, R7, and R8 are the same as or different from each other, and each independently an alkylene group having 1 to 6 carbon atoms, X represents -CRR′-, and R and R′ are the same as or different from each other and each independently hydrogen or an alkyl group having 1 to 6 carbon atoms, and n is an integer from 1 to 10. | ||
| 地址 | Seoul KR | ||