发明名称 Magneto-resistance effect element, magnetic head assembly, magnetic recording and reproducing apparatus, and magnetic memory
摘要 According to one embodiment, a magneto-resistance effect element includes: a first electrode; a second electrode; a first magnetic layer provided between the first and the second electrodes; a second magnetic layer provided between the first magnetic layer and the second electrode; and an oxide layer of a metal oxide provided between the first magnetic layer and the second magnetic layer. The oxide layer includes wustite crystal grains of a wustite structure with a (1 1 1) plane orientation containing iron. A lattice spacing of a (1 1 1) plane of the wustite crystal grains is not less than 0.253 nanometers and not more than 0.275 nanometers.
申请公布号 US8824108(B2) 申请公布日期 2014.09.02
申请号 US201213728281 申请日期 2012.12.27
申请人 Kabushiki Kaisha Toshiba 发明人 Fuji Yoshihiko;Hara Michiko;Fukuzawa Hideaki;Yuasa Hiromi
分类号 G11B5/39;G11C11/16;G11B5/127;G01R33/09;H01L43/10;H01L43/08;H01L27/22 主分类号 G11B5/39
代理机构 Nixon & Vanderhye, P.C. 代理人 Nixon & Vanderhye, P.C.
主权项 1. A magneto-resistance effect element comprising: a first electrode; a second electrode; a first magnetic layer provided between the first electrode and the second electrode; a second magnetic layer provided between the first magnetic layer and the second electrode; and an oxide layer of a metal oxide provided between the first magnetic layer and the second magnetic layer, the oxide layer including wustite crystal grains of a wustite structure with a (1 1 1) plane orientation containing iron, a lattice spacing of a (1 1 1) plane of the wustite crystal grains being not less than 0.253 nanometers and not more than 0.275 nanometers, wherein the oxide layer further includes wurtzite crystal grains with a (0 0 2) plane orientation containing zinc and having a portion overlapping with the wustite crystal grains when projected onto a plane parallel to a thickness direction of the oxide layer.
地址 Tokyo JP