发明名称 |
Magneto-resistance effect element, magnetic head assembly, magnetic recording and reproducing apparatus, and magnetic memory |
摘要 |
According to one embodiment, a magneto-resistance effect element includes: a first electrode; a second electrode; a first magnetic layer provided between the first and the second electrodes; a second magnetic layer provided between the first magnetic layer and the second electrode; and an oxide layer of a metal oxide provided between the first magnetic layer and the second magnetic layer. The oxide layer includes wustite crystal grains of a wustite structure with a (1 1 1) plane orientation containing iron. A lattice spacing of a (1 1 1) plane of the wustite crystal grains is not less than 0.253 nanometers and not more than 0.275 nanometers. |
申请公布号 |
US8824108(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201213728281 |
申请日期 |
2012.12.27 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Fuji Yoshihiko;Hara Michiko;Fukuzawa Hideaki;Yuasa Hiromi |
分类号 |
G11B5/39;G11C11/16;G11B5/127;G01R33/09;H01L43/10;H01L43/08;H01L27/22 |
主分类号 |
G11B5/39 |
代理机构 |
Nixon & Vanderhye, P.C. |
代理人 |
Nixon & Vanderhye, P.C. |
主权项 |
1. A magneto-resistance effect element comprising:
a first electrode; a second electrode; a first magnetic layer provided between the first electrode and the second electrode; a second magnetic layer provided between the first magnetic layer and the second electrode; and an oxide layer of a metal oxide provided between the first magnetic layer and the second magnetic layer, the oxide layer including wustite crystal grains of a wustite structure with a (1 1 1) plane orientation containing iron, a lattice spacing of a (1 1 1) plane of the wustite crystal grains being not less than 0.253 nanometers and not more than 0.275 nanometers, wherein the oxide layer further includes wurtzite crystal grains with a (0 0 2) plane orientation containing zinc and having a portion overlapping with the wustite crystal grains when projected onto a plane parallel to a thickness direction of the oxide layer. |
地址 |
Tokyo JP |