| 摘要 |
A thin film deposition device is disclosed. The thin film deposition device according to an embodiment of the present invention includes a chamber on which a deposition process runs on a substrate; a vision unit, which obtains information about the positions of the substrate and a pattern forming member forming a deposition pattern on the substrate to align the substrate and the patter forming member, on the chamber; and an anti-interference unit connected to the vision unit and preventing the vision unit and the pattern forming member from being interfered when the pattern forming member gets displaced. |
