| 摘要 |
Disclosed is an etching liquid analysis apparatus. The etching liquid analysis apparatus includes: a measurement box having a first room into which an etching liquid flows, a second room and a third room in which a concentration of an element contained in the etching liquid and a temperature of the etching liquid are measured, and a fourth room for discharge of the etching liquid; a first piping that allows the etching liquid to flow into the first room from the outside; and a discharge box that is positioned at a lower end of the measurement box so that the etching liquid can be moved to a detection sensor for element concentration measurement or discharged out of the measurement box, wherein a plurality of opening holes that are connected to the discharge box are provided at the lower end of the measurement box. According to the present invention, bubble generation attributable to a chemical reaction between various chemicals contained in the etching liquid or etching liquid flow can be suppressed, and a concentration of copper contained in the etching liquid and a concentration and a temperature of the chemical can be measured in real time. Accordingly, the concentration of the chemicals contained in the etching liquid can be maintained to be constant, and a user does not have to supply the chemicals in person. |
