RELIABLE PLASMA IGNITION AND REIGNITION

摘要

This disclosure describes systems, methods, and apparatus for ensuring desirable ignition of plasma in a plasma processing chamber via providing increased instantaneous power during an ignition period for both continuous wave (CW) and pulsed power delivery. The systems, methods, and apparatus can be applied to both initial ignition of a plasma and reignition of a plasma where pulsed power delivery leads to periodic extinction of the plasma.

主权项

1. A method of providing power to a plasma processing chamber, the method comprising:
providing power from a balanced amplifier to a plasma processing chamber; monitoring a first characteristic of the plasma processing system; comparing the first characteristic to a variable protection limit; reducing the power if the first monitored characteristic exceeds the variable protection limit; raising the variable protection limit at a start of power delivery to the plasma; and reducing the variable protection limit.