SUBSTRATE RAPID THERMAL HEATING SYSTEM AND METHODS

摘要

Provided are an apparatus and a method for performing a rapid thermal process on a semiconductor and a different substrate. Heating lamps which are arranged with an array or a different configuration generates light or heat radiation. The light and heat radiation which forms a radiation beam of high intensity light and heat is guided through a heating slot. The radiation beam is guided to a platen which includes multiple substrates. The apparatus and method control the rotation and translation of the platen with regard to the heating slot and also include a controller which controls power that is individually and collectively supplied to the heating lamps. A program for manipulating the platen to raise the temperature to a desired temperature during a desired time interval is performed in order to perform a desired thermal process on all parts of all the substrates.