A METHOD OF PRODUCING A P-TYPE NITRIDE SEMICONDUCTOR AND A METHOD OF MANUFACTURING A NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE BY USING THE SAME
摘要
One aspect of the present invention provides a method for manufacturing a p-type nitride semiconductor which includes the steps of growing a first nitride semiconductor layer doped with a p-type impurity with a first concentration; thermally processing the first nitride semiconductor layer to activate the p-type impurity; and growing a second nitride semiconductor layer doped with the p-type impurity with a second concentration which is higher than the first concentration on the first nitride semiconductor layer.
申请公布号
KR20140104062(A)
申请公布日期
2014.08.28
申请号
KR20130016313
申请日期
2013.02.15
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
LEE, JONG HYUN;KIM, KI SUNG;KIM, BUM JOON;SA, KONG TAN;YOON, SUK HO;JEONG, JAE DEOK