发明名称 |
FUSED METAL NANOSTRUCTURED NETWORKS, FUSING SOLUTIONS WITH REDUCING AGENTS AND METHODS FOR FORMING METAL NETWORKS |
摘要 |
Reduction/oxidation reagents have been found to be effective to chemically cure a sparse metal nanowire film into a fused metal nanostructured network through evidently a ripening type process. The resulting fused network can provide desirable low sheet resistances while maintaining good optical transparency. The transparent conductive films can be effectively applied as a single conductive ink or through sequential forming of a metal nanowire film with the subsequent addition of a fusing agent. The fused metal nanowire films can be effectively patterned, and the patterned films can be useful in devices, such as touch sensors. |
申请公布号 |
US2014238833(A1) |
申请公布日期 |
2014.08.28 |
申请号 |
US201313777802 |
申请日期 |
2013.02.26 |
申请人 |
C3NANO INC. |
发明人 |
Virkar Ajay;Yang Xiqiang;Li Ying-Syi;McKean Dennis;LeMieux Melburne C. |
分类号 |
H03K17/96;B32B15/02;H05K1/02;B32B5/02 |
主分类号 |
H03K17/96 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming a fused metal nanostructured network, the method comprising,
contacting metal nanowires with a fusing solution comprising a reducing agent source and a metal ion source to reduce metal ions to its corresponding metal element to fuse the metal nanowires together to form the fused metal nanostructured network. |
地址 |
Hayward CA US |