发明名称 FUSED METAL NANOSTRUCTURED NETWORKS, FUSING SOLUTIONS WITH REDUCING AGENTS AND METHODS FOR FORMING METAL NETWORKS
摘要 Reduction/oxidation reagents have been found to be effective to chemically cure a sparse metal nanowire film into a fused metal nanostructured network through evidently a ripening type process. The resulting fused network can provide desirable low sheet resistances while maintaining good optical transparency. The transparent conductive films can be effectively applied as a single conductive ink or through sequential forming of a metal nanowire film with the subsequent addition of a fusing agent. The fused metal nanowire films can be effectively patterned, and the patterned films can be useful in devices, such as touch sensors.
申请公布号 US2014238833(A1) 申请公布日期 2014.08.28
申请号 US201313777802 申请日期 2013.02.26
申请人 C3NANO INC. 发明人 Virkar Ajay;Yang Xiqiang;Li Ying-Syi;McKean Dennis;LeMieux Melburne C.
分类号 H03K17/96;B32B15/02;H05K1/02;B32B5/02 主分类号 H03K17/96
代理机构 代理人
主权项 1. A method for forming a fused metal nanostructured network, the method comprising, contacting metal nanowires with a fusing solution comprising a reducing agent source and a metal ion source to reduce metal ions to its corresponding metal element to fuse the metal nanowires together to form the fused metal nanostructured network.
地址 Hayward CA US