发明名称 Chemically amplified negative resist composition and patterning process
摘要 A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms a negative resist pattern of a profile with minimized LER and undercut.
申请公布号 US8815491(B2) 申请公布日期 2014.08.26
申请号 US201213407325 申请日期 2012.02.28
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 Masunaga Keiichi;Domon Daisuke;Watanabe Satoshi
分类号 G03F7/004;G03F7/027 主分类号 G03F7/004
代理机构 Westerman, Hattori, Daniels & Adrian, LLP 代理人 Westerman, Hattori, Daniels & Adrian, LLP
主权项 1. A chemically amplified negative resist composition comprising a polymer, adapted such that the polymer may turn insoluble in alkaline developer by reacting with a crosslinker and/or a recurring unit having a crosslinkable functional group in the polymer under the catalysis of an acid generated upon exposure to high-energy radiation, to form crosslinks between polymer molecules, said polymer consisting of: recurring units of the general formula (1), recurring units of at least one type selected from the general formulae (2), (3), and (4), recurring units of at least one type selected from the general formulae (5), (6), and (7), recurring units of the general formula (M-1) or (M-2), and recurring units of the general formula (11), (12) or (13):wherein A is a C1-C10 divalent hydrocarbon group in which some or all hydrogen atoms may be replaced by fluorine or a methylene moiety may be replaced by oxygen, Rf is each independently hydrogen, fluorine, trifluoromethyl, or pentafluoroethyl, with the proviso that not all Rf's are hydrogen, B is a single bond or a C1-C10 alkylene group which may be separated by ethereal oxygen, R1 is hydrogen, fluorine, methyl, or trifluoromethyl, R2, R3, and R4 are each independently a substituted or unsubstituted, straight or branched C1-C10 alkyl, alkenyl or oxoalkyl group, or a substituted or unsubstituted C6-C10 aryl, aralkyl or aryloxoalkyl group, any two or more of R2, R3, and R4, taken together, may be a divalent organic group to form a ring with the sulfur atom, R5 is each independently a C1-C6 alkyl group, a is an integer of 0 to 4, b is an integer of 1 to 5, c and d each are an integer of 1 to 4, e is an integer of 0 to (4-c), f is an integer of 0 to (4-d), p is independently 0 or 1, and t is an integer of 0 to 2,wherein C is a single bond or a C1-C10 alkylene group which may be separated by ethereal oxygen, R1 is as defined above, R6 is each independently halogen, an optionally halo-substituted C1-C8 alkyl or alkoxy group, a C6-C20 aromatic ring-containing hydrocarbon group, or an optionally halo-substituted C1-C12 acyloxy group, g is an integer of 0 to 5, h and i each are an integer of 0 to 4, q is 0 or 1, and s is an integer of 0 to 2,wherein R1 is as defined above, R8 is hydrogen or a straight, branched or cyclic C1-C6 monovalent hydrocarbon group, R9 is each independently a straight, branched or cyclic C1-C6 monovalent hydrocarbon group which may contain oxygen, or halogen, e is an integer of 0 to 4, and u is an integer of 0 to 2,wherein R1 is hydrogen, methyl or trifluoromethyl, Y is oxygen or methylene, Z is hydrogen or hydroxyl, R′ is C1-C4 alkyl and p is an integer of 0 to 3, wherein the recurring units or formula (1) account for 0.5 to 10 mol %, the sum of recurring units of formulae (2), (3), and (4) accounts for 50 to 99.5 mol %, recurring units of formula (5), (6) or (7) account for up to 40 mol %, recurring units of formula (M-1) or (M-2) account for up to 20 mol %, and recurring units of formula (11), (12) or (13) account for up to 30 mol %, based on the entire recurring units of the polymer.
地址 Tokyo JP