| 摘要 |
PROBLEM TO BE SOLVED: To defect the sensitivity of a substrate used for an exposure device at high precision.SOLUTION: In the exposure device provided with a light modulation element array in which micromirrors are arranged in a two-dimentional way, a plurality of mask patterns in which a micromirror service factor is gradually reduced are prepared. Then, every exposure operation, the mask patterns are successively switched to practice overlap exposure operations, and a step tablet pattern having a gradation where pattern concentration is continuously changed along a scanning direction is formed. |
