| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition mask in which a vapor deposition material can be deposited at high utilization efficiency.SOLUTION: A vapor deposition mask 20 includes an effective region 22 in which plural through holes 25 are formed, and a peripheral region 23 positioned around the effective region. In the effective region, plural recess parts 30 whose width gets larger toward one side are provided on one side in a normal direction of the deposition mask, and the recess parts 30 define a through hole 25. A wall surface 31 of at least one recess part is merged, at its whole circumference, with a wall surface of any other recess part positioned around the recess part. |
