METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING CONTAMINATION PROTECTION

摘要

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled. to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

主权项

1. An apparatus for use in an extreme ultraviolet (EUV) actinic mask inspection system or an EUV lithographic system, the apparatus having contamination protection and comprising:
a duct having a first end opening, a second end opening and an intermediate opening disposed intermediate the first end opening the second end opening; an optical component disposed so as 1) to receive EUV light from first end opening after the light has passed through second end opening or 2) to send light through the first end opening to the second end opening; and a source of low pressure gas at a first pressure, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening, the first end opening and the second end opening maintained at a lower pressure than the first pressure.