PHOTOLITHOGRAPHY MASK DESIGN SIMPLIFICATION

摘要

A photolithography mask design in simplified. In one example, a target mask design is optimized for a photolithography mask. Medial axes of the design and assist features on the optimized mask are identified. These are simplified to lines. Lines that are distant from a respective design feature are pruned. The remaining lines are simplified and then thickened to form assist features.

主权项

1. A method comprising:
optimizing a target mask design for a photolithography mask the target mask design comprising a plurality of design features, the optimized design having a plurality of assist features to print at least a portion of the design features; identifying medial axes of the design and assist features on the optimized mask as lines; associating design and assist features on the optimized mask with the lines; pruning lines that are distant from a respective design feature; simplifying the lines that are not pruned; and thickening the simplified lines to form assist features.