Environmental system including vacuum scavenge for an immersion lithography apparatus

摘要

A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

主权项

1. A lithographic projection apparatus in which liquid is disposed between a projection system and a substrate onto which the projection system projects an image during exposure of the substrate, the lithographic projection apparatus comprising:
a liquid confinement member extending along at least a part of a boundary of a space between the projection system and the substrate, the space having a cross-sectional area smaller than the area of the substrate, the liquid confinement member positioned adjacent a final surface of the projection system, confining the liquid within the space, and comprising: a first opening formed in a face of the member, the face arranged to oppose a surface of the substrate, the first opening located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second opening formed in the face and located radially outward, with respect to an optical axis of the projection system, of the first opening to remove fluid.