发明名称 |
Coating method |
摘要 |
A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed. |
申请公布号 |
US8808798(B2) |
申请公布日期 |
2014.08.19 |
申请号 |
US201213569345 |
申请日期 |
2012.08.08 |
申请人 |
Tokyo Electron Limited |
发明人 |
Kitano Takahiro;Obata Koichi;Inada Hiroichi;Ogata Nobuhiro |
分类号 |
B05D3/12;H01L21/67;H01L21/683;H01L21/027;G03F7/16 |
主分类号 |
B05D3/12 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A coating method comprising:
holding a back side central portion of a substrate by a substrate holding member and thereby supporting the substrate in a horizontal state; supplying a coating liquid onto a front side central portion of the substrate from a coating nozzle; rotating the substrate holding member about a vertical axis by a rotational driving unit at a first rotational speed, so as to spread the coating liquid supplied on the front side central portion of the substrate toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid; forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate by a liquid film forming mechanism including a counter face portion facing the back side peripheral portion of the substrate, while supplying the process liquid onto the counter face portion from a process liquid supply portion of the liquid film forming mechanism, so that the process liquid is adsorbed by a surface tension of the process liquid on the counter face portion and the peripheral portion of the substrate being rotated and the liquid film is thereby formed; damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism disposed around the substrate holding member and including delivery holes arrayed in a rotational direction of the substrate, while delivering a gas from the delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed; and moving up and down the posture regulating mechanism, respectively, before and after the damping of the vertical wobble, between a working position for regulating the vertical wobble of the peripheral portion of the substrate and a waiting position below the working position. |
地址 |
Tokyo JP |