Exposure apparatus and article manufacturing method

摘要

An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.

主权项

1. An apparatus for exposing a substrate to an energy in a vacuum, the apparatus comprising:
a stage having a mirror surface and configured to hold the substrate so that a surface of the substrate to be exposed is arranged along an X-Y plane; a mirror configured to deflect a light into a direction of a Z axis orthogonal to the X-Y plane; a measuring device configured to measure a position of the stage in the direction of the Z axis with the light in which the mirror surface is irradiated via the mirror; a first driving device configured to move the measuring device in accordance with a movement of the stage so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; a first cooling device including a first radiation plate which is arranged between the optical system and the stage in the direction of the Z axis and has a first opening which the energy passes and a second opening which the light moved in accordance with the movement of the measuring device passes, including a first cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate; and a second cooling device including a second radiation plate having a third opening which a light to be deflected by the mirror passes, including a second cooler configured to cool the second radiation plate, and configured to perform radiation cooling of the substrate via the mirror and the second opening.