Provided is an apparatus to generate remote plasma which condenses remote plasma on a process object, and increases plasma processing efficiency. The apparatus to generate remote plasma includes: a dielectric supporter which has a main body connected to a discharge gas inlet and a nozzle part connected to a plasma outlet; an operation electrode fixated to the main body, receives AC voltage from a power source, and generates plasma in the inner space of the body; and a ground electrode which supports the process object from the outside of the nozzle part. The nozzle part includes an inclined surface connected to the main body. The remote plasma is condensed on the process object by reducing the width of the plasma outlet.
