| 主权项 |
1. A positive photoresist developer comprising a basic aqueous solution containing a nonionic surfactant and an ammonium compound,
wherein said nonionic surfactant has one or more kinds of alkyleneoxide group repeating structure in which 11˜70 units of said alkyleneoxide group are included and content of said nonionic surfactant is 0.5˜10 mass % to total mass of said photoresist developer as 100 mass %; said ammonium compound is represented by a following general formula (1): [In the formula (1), R1 is a hydrocarbon group represented by —CH2—Ar, wherein Ar is an aromatic hydrocarbon group of carbon number 6-10; each of R2, R3, and R4 is independently an organic group of carbon number 1 to 5, or two or three thereof are bonded each other to form a heterocycle of carbon number 4˜20; and X is OH, Cl, Br, or I.] and content of said ammonium compound is 0.01˜5.0 mass % to total mass of said photoresist developer as 100 mass %; and a basic compound to make said basic aqueous solution basic is represented by a following general formula (3): [In the formula (3), each of R11, R12, R13, and R14 is independently a hydrogen atom or an organic group of carbon number 1-3]; and said nonionic surfactant is represented by a following general formula (2):
R5—Z—{(YO)b—R6}a (2) [In the formula (2), a is an integer of 1 or 2; each of R5 and R6 is a hydrogen atom or an organic group of carbon number 1-40; Z is an (a+1) valent heteroatom; and (YO)b is represented by a following general formula (2-1) or (2-2):
—(CH2CH2O)l—(CH(CH3)CH2O)m—(CH2CH2O)n— (2-1)—(CH(CH3)CH2)l—(CH2CH2O)m—(CH(CH3)CH2O)n— (2-2) wherein l and m are each independently an integer of 3-40; n is an integer of 1-30; where a is 1, l+m+n is 11-70; where a is 2, l+m+n is 6-35; and where a is 2, two {(YO)b— R6} may be the same or different from each other.]. |
