| 摘要 |
<p>In the present invention, provided is a fabrication method of a nanowire device improving productivity by manufacturing nanowire uniformly with respect to the entire surface of a single substrate. To accomplish the objective, in the present invention, provided is a fabrication method of a nanowire device for forming nanowire on the entire surface of a substrate. The fabrication method includes a substrate preparing step of preparing a substrate for forming nanowires; a substrate surface treating step of immersing the prepared substrate in a polylysine solution for a certain period of time; a substrate coating step of coating As atoms uniformly on the entire surface of the substrate; and a nanowire forming step of forming InAsP nanowire arrangement on the coated substrate.</p> |
