发明名称 Semiconductor light emitting device and method for manufacturing the same
摘要 Certain embodiments provide a method for manufacturing a semiconductor light emitting device, including: providing a first stack film on a first substrate, the first stack film being formed by stacking a p-type nitride semiconductor layer, an active layer having a multiquantum well structure of a nitride semiconductor, and an n-type nitride semiconductor layer in this order; forming an n-electrode on an upper face of the n-type nitride semiconductor layer; and forming a concave-convex region on the upper face of the n-type nitride semiconductor layer by performing wet etching on the upper face of the n-type nitride semiconductor layer with the use of an alkaline solution, except for a region in which the n-electrode is formed.
申请公布号 US8809833(B2) 申请公布日期 2014.08.19
申请号 US201314057445 申请日期 2013.10.18
申请人 Kabushiki Kaisha Toshiba 发明人 Zaima Kotaro;Gotoda Toru;Oka Toshiyuki;Nunoue Shinya
分类号 H01L33/22;H01L33/24 主分类号 H01L33/22
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A semiconductor light emitting device comprising: a substrate having a first face and a second face opposed to the first face; a first metal layer having a lower face facing to the first face of the substrate and an upper face; a stack film including a p-type nitride semiconductor layer having a lower face facing to the upper face of the first metal layer and an upper face, an active layer provided on the upper face of the p-type nitride semiconductor layer and including a multiquantum well structure of a nitride semiconductor, and an n-type nitride semiconductor layer having a lower face facing to the active layer and an upper face; an n-electrode connected to the n-type nitride semiconductor layer; a p-electrode provided on the second face of the substrate; and a concave-convex region provided on the upper face of the n-type nitride semiconductor layer, the concave-convex region having first concavities and convexities and second concavities and convexities that are smaller than the first concavities and convexities, the first concavities and convexities randomly coexisting with the second concavities and convexities, the first concavities and convexities having height differences of 1 to 3 μm, and the second concavities and convexities having height differences of 300 nm or smaller.
地址 Minato-ku JP