发明名称 ANTIREFLECTION FILM AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an antireflection film that can be manufactured with high productivity and at a low cost, the antireflection film having excellent reflection characteristics (low reflectivity) and an excellent reflective hue closer to neutral at broad band, and having excellent mechanical characteristics.SOLUTION: An antireflection film includes: a base material; and a middle refractive index layer, a high refractive index layer and a low refractive index layer, in this order from the base material. A refractive index of the base material is within a range of 1.45-1.65. The middle refractive index layer is formed by coating on the base material and curing a middle refractive index layer formation composition including a binder resin and inorganic fine particles, and has a refractive index within a range of 1.67-1.78 and a thickness of 70-120 nm. The high refractive index layer has a refractive index within a range of 2.00-2.60 and a thickness of 10-25 nm. The low refractive index layer has a refractive index within a range of 1.35-1.55 and a thickness of 70-120 nm.
申请公布号 JP2014145914(A) 申请公布日期 2014.08.14
申请号 JP20130014458 申请日期 2013.01.29
申请人 NITTO DENKO CORP 发明人 KISHI ATSUSHI;UENO TOMONORI;KURAMOTO HIROTAKA
分类号 G02B1/11;G02B5/30;G02F1/1335 主分类号 G02B1/11
代理机构 代理人
主权项
地址