发明名称 METHOD AND APPARATUS FOR CLEANING PHOTOMASK HANDLING SURFACES
摘要 The cleaning device may clean the handling and support interface for a reticle inside a reticle handling tool, such as a micrographic scanner/stepper printer, without opening the tool. The cleaning device may have the same or approximate form factor as either a reticle without a pellicle or a reticle with a pellicle. The cleaning device is transported through the reticle handling tool in the same manner and along the same path as a reticle, contacted against surfaces that a reticle touches, and transferred out of the reticle handling tool. The cleaning device comprises a cleaning pad, secured to the base substrate, the cleaning pad having predetermined characteristics that cause the cleaning pad to remove contamination and particulates from the reticle transfer and placement equipment when the cleaning device contacts the robot transfer arm(s) and reticle positioning/support interface.
申请公布号 US2014226136(A1) 申请公布日期 2014.08.14
申请号 US201313764196 申请日期 2013.02.11
申请人 Gagnon Patrick J. 发明人 Gagnon Patrick J.
分类号 G03F1/82 主分类号 G03F1/82
代理机构 代理人
主权项 1. A cleaning device for cleaning reticle transfer and placement equipment, comprising: a base substrate, said base substrate having approximately a form factor of a reticle used by said reticle transfer and placement equipment; and a cleaning pad attached to said base substrate, said cleaning pad having at least one of a density, an elasticity, a hardness, a particle conformity, a contamination conformity, a particle trapping ability, and a contamination trapping ability such that at least one of said contamination and said particles on said reticle transfer/placement equipment are transferred to said cleaning pad when said cleaning device is contacted by said reticle transfer and placement equipment.
地址 Richardson TX US