| 摘要 |
A light-transmitting mold structure having a mold pattern corresponding to a portion to form a pattern by nanoimprint and a conductive film pattern corresponding to a portion to form a pattern by nonadiabatic near-field exposure is used to irradiate UV light from a back surface of the mold structure and to perform nonadiabatic near-field light exposure in an imprint process so that all patterns having various sizes for simulating various designs can be faithfully transferred by a single imprint process (imprint & UV exposure). |
