摘要 |
<p>Provided is a substrate for superconductive film formation, which includes a metal substrate, and an oxide layer formed directly on the metal substrate, containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm. A method of manufacturing a substrate for superconductive film formation, which includes forming an oxide layer directly on a metal substrate, the oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.</p> |
申请人 |
INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER, THE JURIDICAL FOUNDATION;FURUKAWA ELECTRIC CO., LTD.;JAPAN FINE CERAMICS CENTER |
发明人 |
MIYATA, SEIKI;FUKUSHIMA, HIROYUKI;KURIKI, REIJI;IBI, AKIRA;YOSHIZUMI, MASATERU;KINOSHITA, AKIO;YAMADA, YUTAKA;SHIOHARA, YUH;YOSHIDA, RYUJI;KATO, TAKEHARU;HIRAYAMA, TSUKASA |