发明名称 Inspection method and inspection apparatus
摘要 This application relates to an inspection apparatus including: a stage which holds a specimen; an illumination optical system which illuminates a surface of the specimen held on the stage, with illumination light; a dark-field optical system which detects scattered light generated by the illumination light with which the specimen is illuminated; a photoelectric converter which converts the scattered light detected by the dark-field optical system, into an electric signal; an A/D converter which converts the electric signal obtained by conversion by the photoelectric converter, into a digital signal; a judgement unit which determines the dimension of a foreign substance on the surface of the specimen on the basis of a magnitude of the scattered light from the foreign substance; and a signal processor which determines an inspection condition by use of information on the scattered light from the specimen surface.
申请公布号 US8804108(B2) 申请公布日期 2014.08.12
申请号 US200913202727 申请日期 2009.12.04
申请人 Hitachi High-Technologies Corporation 发明人 Mitomo Kenji;Oka Kenji
分类号 G01N21/00 主分类号 G01N21/00
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. An inspection apparatus comprising: an illumination system configured to supply a sample with a light; a detection system configured to detect the light from the sample; a processing system configured to acquire a predetermined frequency component which is an electrical signal from the detection system, wherein the predetermined frequency component is lower than a frequency component indicating an anomaly on the sample.
地址 Tokyo JP