发明名称 |
Inspection method and inspection apparatus |
摘要 |
This application relates to an inspection apparatus including: a stage which holds a specimen; an illumination optical system which illuminates a surface of the specimen held on the stage, with illumination light; a dark-field optical system which detects scattered light generated by the illumination light with which the specimen is illuminated; a photoelectric converter which converts the scattered light detected by the dark-field optical system, into an electric signal; an A/D converter which converts the electric signal obtained by conversion by the photoelectric converter, into a digital signal; a judgement unit which determines the dimension of a foreign substance on the surface of the specimen on the basis of a magnitude of the scattered light from the foreign substance; and a signal processor which determines an inspection condition by use of information on the scattered light from the specimen surface. |
申请公布号 |
US8804108(B2) |
申请公布日期 |
2014.08.12 |
申请号 |
US200913202727 |
申请日期 |
2009.12.04 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Mitomo Kenji;Oka Kenji |
分类号 |
G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. An inspection apparatus comprising:
an illumination system configured to supply a sample with a light; a detection system configured to detect the light from the sample; a processing system configured to acquire a predetermined frequency component which is an electrical signal from the detection system, wherein the predetermined frequency component is lower than a frequency component indicating an anomaly on the sample. |
地址 |
Tokyo JP |